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Welcome

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Hello Guiding light and welcome to Wikipedia! I'm glad you've chosen to join us. This is a great project with lots of dedicated people, which might seem intimidating at times, but don't let anything discourage you. Be bold!, explore, and contribute. If you want to learn more,

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Float around for awhile until you find something that tickles your fancy. One easy way to do this is to hit the random page button in the navigation bar to the left. You can write new articles, add to existing ones, or edit any and all pages that appear. There are also many great committees and groups that focus on particular jobs. My personal favorite stomping grounds are Wikipedia:Translation into English and Wikipedia:Cleanup for sloppy articles, but they may not interest you. Finally, the Wikimedia Foundation has several other wiki projects that you might enjoy more, but Wikipedia is the most popular by far.

There are a few crucial points to keep in mind when editing. Be civil with users, strive to maintain a neutral point of view, and show good etiquette like signing your comments with four tildas like this: ~~~~ If you have any more questions, always feel free to ask me anything on my talk page or ask the true experts at Wikipedia:Help desk. Again, welcome! Draeco 03:06, 27 November 2005 (UTC)[reply]

Photomask

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I am very sorry; The only thing I wanted is to revert your deletion of the word "vol." from biblio ref. I was careless not to notice that you had other important contribution. mikka (t) 18:29, 27 November 2005 (UTC)[reply]

Proximity effect

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Thank you for your recent addition to Proximity effect! I created the article (there was a stub about a comic book there before) and so I watch it, but as I'm not a physicist I lack the expertise to bring the article up to par. Your addition is much appreciated. KillerChihuahua 13:19, 3 December 2005 (UTC)[reply]

Thanks

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Hi. Thank you for your additions to phase-shift mask and the overall nice work you are doing in semiconductors-related articles. I have a question. Do you know where we could get a picture for the photomask article? I added a diagram there, but having also a picture of a real mask could be helpful. (I don't expect that you'll just deliver the picture, just wondering. :) Thanks. Oleg Alexandrov (talk) 14:54, 2 November 2007 (UTC)[reply]

Dear Oleg, thanks for your support. I do not have a photomask picture (yet), but if I do get one, I will still need to ask for permission to post. Will be looking...Sincerely, Guiding light 04:25, 6 November 2007 (UTC)[reply]
Cool. I cropped the Image:80 nm pitch contact.jpg from phase-shift mask and moved one of its diagrams under the other one (as opposed to the original side-by-side alignment). Hope that's fine with you. Oleg Alexandrov (talk) 04:58, 6 November 2007 (UTC)[reply]
(If the image looks odd in the article after my resizing, you may need to do a hard reload to refresh the page.) Oleg Alexandrov (talk) 05:00, 6 November 2007 (UTC)[reply]

Multiple patterning

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Hi guiding light. I wonder if you could comment on my comment at Talk:Double patterning. Thanks. Oleg Alexandrov (talk) 05:34, 9 March 2008 (UTC)[reply]

Image:Resolution vs. DOF.JPG listed for deletion

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I noticed that the image Image:Resolution vs. DOF.JPG was blurry because it was stored as JPG. I converted it to PNG, Image:Resolution vs. DOF.png and listed the jpg version for deletion. I hope you don't mind. Boilerplate text follows.

An image or media file that you uploaded or altered, Image:Resolution vs. DOF.JPG, has been listed at Wikipedia:Images and media for deletion. Please see the discussion to see why this is (you may have to search for the title of the image to find its entry), if you are interested in it not being deleted. Thank you. Han-Kwang (t) 08:31, 4 July 2008 (UTC)[reply]

It seems that you take this conversion/deletion a bit personally; If I had known, I would have discussed it with you beforehand. If you want, I can try to retract my IfD proposal.
One reason for changing to PNG is that compression artifacts are especially noticeable in Wikipedia's thumbnails because of the low JPEG quality setting used there. I thought it'd be more useful to fix the problem rather than slapping a {{badJPEG}} on the image. WP:PIFU gives some advice how to reduce the image file size. You mentioned that JPEG is smaller than PNG. However, Image:Resolution vs. DOF.JPG was 28 kB, while Image:Resolution vs. DOF.png (the version I uploaded originally) was 19 kB. I didn't even convert it to indexed mode rather than truecolor, which reduces the size to just 6 kB (16 colors), as does your new PNG version. Han-Kwang (t) 15:35, 6 July 2008 (UTC)[reply]

Thanks for the information. I had not done a thorough comparison before, but after viewing the link you had earlier, it makes more sense. The resolution vs DOF had to be updated for content anyway; following your suggestion, I used PNG format this time.Guiding light (talk) 01:14, 7 July 2008 (UTC)[reply]

Resolution vs. DOF image

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Hi Guiding light. Thank you for making Image:Resolution vs. DOF.png prettier than before. I have a couple of suggestions, for future uploads, if you don't mind. First, it is good to crop the whitespace around the borders as much as possible, not for reason of making the picture smaller, but because pictures usually show up as thumbnails, and then a picture with less empty space around it can show up a bit bigger and clearer. Second, if possible, pictures of a bit higher resolution are preferred. In this picture the text appears kind of pixelated.

Lastly, I read your comment here. I do agree PNG is a higher quality format. I think we should select for that, rather than for which picture takes less space. A PNG picture of a few hundreds pixels is very small in size anyway. Oleg Alexandrov (talk) 03:08, 12 July 2008 (UTC)[reply]

Okay, no problem, thanks for the suggestions.Guiding light (talk) 12:33, 20 July 2008 (UTC)[reply]

A tag has been placed on File:Jumping to NGL.PNG requesting that it be speedily deleted from Wikipedia. This has been done under section F1 of the criteria for speedy deletion, because the image is an unused redundant copy (all pixels the same or scaled down) of an image in the same file format, which is on Wikipedia (not on Commons), and all inward links have been updated.

If you think that this notice was placed here in error, you may contest the deletion by adding {{hangon}} to the top of the page that has been nominated for deletion (just below the existing speedy deletion or "db" tag - if no such tag exists then the page is no longer a speedy delete candidate and adding a hangon tag is unnecessary), coupled with adding a note on the talk page explaining your position, but be aware that once tagged for speedy deletion, if the page meets the criterion, it may be deleted without delay. Please do not remove the speedy deletion tag yourself, but don't hesitate to add information to the page that would render it more in conformance with Wikipedia's policies and guidelines. Tim1357 talk 04:58, 22 May 2010 (UTC)[reply]

File:Jumping several nodes.PNG listed for deletion

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A file that you uploaded or altered, File:Jumping several nodes.PNG, has been listed at Wikipedia:Files for deletion. Please see the discussion to see why this is (you may have to search for the title of the image to find its entry), if you are interested in it not being deleted. Thank you.

E-beam lithography write time?

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Hi, was wondering if you would happen to know what the source of the equation for electron beam lithography write time on the page would be. Is there a book? A paper? I've been trying to trace it and can't seem to find it. Thanks a lot! Shaztaz (talk) 17:25, 28 June 2010 (UTC)[reply]

It is given in many places, but some sources have been removed. Here is one I found still available online: http://usstepper.com/IDI-SPIE%20paper.pdf I will also put the reference in the article. ThanksGuiding light (talk) 13:25, 7 July 2010 (UTC)[reply]


Thanks, appreciate it. Shaztaz (talk) 22:34, 15 July 2010 (UTC)[reply]

16 nm "design rule?"

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Sorry, but there's an edit you made to the 16 nanometer article that I've been curious about since the first time I saw it. What does it mean when you say "the design rule" for 16 nm is 30 nm? What design rule exactly? If you could clarify this for those of us not conversant in industry jargon, that would be awesome. 146.6.208.13 (talk) 15:47, 26 April 2011 (UTC)[reply]

It should mean the half pitch for that referenced statement. I can change it to say that, if that is clear enough. Guiding light (talk) 23:25, 25 May 2011 (UTC)[reply]
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File:K1 vs node.PNG listed for deletion

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A file that you uploaded or altered, File:K1 vs node.PNG, has been listed at Wikipedia:Files for deletion. Please see the discussion to see why this is (you may have to search for the title of the image to find its entry), if you are interested in it not being deleted. Thank you. Calliopejen1 (talk) 19:01, 7 April 2012 (UTC)[reply]

11 nanometer, erroneous ref

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J. Word et al., Proc. SPIE 6925 (2008)., which you added in June 2009, looks incorrect. For one thing there is no paper by Word in Proc. SPIE 6925. Could you please have a look at it? --bender235 (talk) 23:15, 18 June 2012 (UTC)[reply]

16->14nm, 11->10 etc

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Is there a reason you are moving these pages? The table and articles were following nodes that were specified by the International Technology Roadmap for Semiconductors as seen in this table on the left. Unless ITRS has updated their vision, you will need to undo your changes. 14->10->7->5nm is Intel's current roadmap, which is NOT what these tables and articles are defined by. Other fabs will be sticking with plans originally made by ITRS or their own. Colinstu (talk) 09:56, 1 July 2012 (UTC)[reply]

Help, please :)

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Hello Guiding light! You uploaded this image on commons. Could you please add the appropriate categories or let me know what the diagram is all about? :-) Thanks a bunch! --Hedwig in Washington (TALK) 23:24, 6 August 2012 (UTC)[reply]

Vectorised image

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Hi Guiding light, I vectorised your image Commons:File:EUV photoelectrons and secondaries.jpeg at Commons:File:EUV photoelectrons and secondaries (vector).svg. I hope you like it! — Preceding unsigned comment added by 2pem (talkcontribs) 14:12, 14 January 2014 (UTC)[reply]

File permission problem with File:Intel Litho Landscape 2013.png

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Thanks for uploading File:Intel Litho Landscape 2013.png. I noticed that while you provided a valid copyright licensing tag, there is no proof that the creator of the file has agreed to release it under the given license.

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Replaceable fair use File:CD 3s uniformity vs. dose.png

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Replaceable fair use File:Diffraction order efficiencies from EUV line-space grating.png

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Thanks for uploading File:Diffraction order efficiencies from EUV line-space grating.png. I noticed that this file is being used under a claim of fair use. However, I think that the way it is being used fails the first non-free content criterion. This criterion states that files used under claims of fair use may have no free equivalent; in other words, if the file could be adequately covered by a freely-licensed file or by text alone, then it may not be used on Wikipedia. If you believe this file is not replaceable, please:

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Re-organized page

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Removed material dated before 2013. Also the "Unexpected Resolution Limits" section was split and separated into different sections, relating to resist, secondary electrons, EUV optics and throughput. If there is any deleted material you like put back, please let me know, thanks.Guiding light (talk) 08:03, 18 August 2014 (UTC)[reply]

A tag has been placed on File:Increasing litho steps for advanced nodes.png requesting that it be speedily deleted from Wikipedia. This has been done under section F9 of the criteria for speedy deletion, because the image appears to be a blatant copyright infringement. For legal reasons, we cannot accept copyrighted images or text borrowed from other web sites or printed material, and as a consequence, your addition will most likely be deleted. Wikipedia takes copyright violations very seriously and persistent violators will be blocked from editing.

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Orphaned non-free image File:EUV Multilayer telecentricity.png

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Orphaned non-free image File:EUV secondary electron path.png

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Problems with upload of File:Complementary polarity line-cutting.png

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Can you check the update I made here, wasn't sure where the root symbol was. Can you check?

BTW you can use TeX math for equations. see Help:Formula Sfan00 IMG (talk) 08:54, 23 September 2015 (UTC)[reply]

Thanks - I was trying to determine if you meant Sfan00 IMG (talk) 08:57, 24 September 2015 (UTC)[reply]

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Multiple patterning image

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Hi can you convert the image you created in the lead into a wikitable? This makes the text much more accessible in general and especially for screen readers. Additionally the text will wrap properly for those with smaller screens. I've taken the liberty to transcribe most of it for you in case you don't know the syntax; all that's missing is the references:

Caption here
Minimum Exposures Metal Half-pitch Node References
193i
193i+193i
45 nm 32/28/22 nm [1]
193i+193i 32 nm 20/16/14 nm [2]
193i+193i 24 nm 10 nm [3]
193i+193i
193i+193i+193i
193i+EUV
16 nm 7 nm [4]
193i+193i+193i
193i+193i+193i+193i
193i+EUV+EUV
EUV+EUV+EUV
11 nm 5 nm [5]

Thanks! Opencooper (talk) 14:10, 12 February 2016 (UTC)[reply]

References

  1. ^ _
  2. ^ _
  3. ^ _
  4. ^ _
  5. ^ _
You're welcome! I've added the syntax for a caption as well. Opencooper (talk) 09:11, 14 February 2016 (UTC)[reply]

Next-gen lithography

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I'm trying to catch up on current lithography - the last time was 10 years ago - so I'm reading over the next-gen article. Unfortunately it contains a considerable amount of unexplained terminology, like 193i. Would you mind taking a once-over and seeing if some of those could be expanded inline? Thanks! Maury Markowitz (talk) 00:33, 23 April 2016 (UTC)[reply]

File permission problem with File:EUV cross-slit effect.png

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Also:

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File:EUV aberrations across slit.png listed for discussion

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File permission problem with File:EUV WPD 2018.png

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"4 nanometer" listed at Redirects for discussion

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A discussion is taking place to address the redirect 4 nanometer. The discussion will occur at Wikipedia:Redirects for discussion/Log/2021 September 21#2 nm until a consensus is reached, and anyone, including you, is welcome to contribute to the discussion. Mdewman6 (talk) 00:57, 21 September 2021 (UTC)[reply]

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Hello! Voting in the 2021 Arbitration Committee elections is now open until 23:59 (UTC) on Monday, 6 December 2021. All eligible users are allowed to vote. Users with alternate accounts may only vote once.

The Arbitration Committee is the panel of editors responsible for conducting the Wikipedia arbitration process. It has the authority to impose binding solutions to disputes between editors, primarily for serious conduct disputes the community has been unable to resolve. This includes the authority to impose site bans, topic bans, editing restrictions, and other measures needed to maintain our editing environment. The arbitration policy describes the Committee's roles and responsibilities in greater detail.

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Hi. Thank you for your recent edits. An automated process has detected that when you recently edited Extreme ultraviolet lithography, you added a link pointing to the disambiguation page ASML. Such links are usually incorrect, since a disambiguation page is merely a list of unrelated topics with similar titles. (Read the FAQ • Join us at the DPL WikiProject.)

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Thanks for letting me know, sorry for the inconvenience.Guiding light (talk) 11:44, 18 December 2021 (UTC)[reply]

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Hello! Voting in the 2022 Arbitration Committee elections is now open until 23:59 (UTC) on Monday, 12 December 2022. All eligible users are allowed to vote. Users with alternate accounts may only vote once.

The Arbitration Committee is the panel of editors responsible for conducting the Wikipedia arbitration process. It has the authority to impose binding solutions to disputes between editors, primarily for serious conduct disputes the community has been unable to resolve. This includes the authority to impose site bans, topic bans, editing restrictions, and other measures needed to maintain our editing environment. The arbitration policy describes the Committee's roles and responsibilities in greater detail.

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ArbCom 2023 Elections voter message

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Hello! Voting in the 2023 Arbitration Committee elections is now open until 23:59 (UTC) on Monday, 11 December 2023. All eligible users are allowed to vote. Users with alternate accounts may only vote once.

The Arbitration Committee is the panel of editors responsible for conducting the Wikipedia arbitration process. It has the authority to impose binding solutions to disputes between editors, primarily for serious conduct disputes the community has been unable to resolve. This includes the authority to impose site bans, topic bans, editing restrictions, and other measures needed to maintain our editing environment. The arbitration policy describes the Committee's roles and responsibilities in greater detail.

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