User contributions for Guiding light
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A user with 5,901 edits. Account created on 25 November 2005.
22 July 2024
- 02:2002:20, 22 July 2024 diff hist −219 Extreme ultraviolet lithography more concise, density is true impact
21 July 2024
- 15:4515:45, 21 July 2024 diff hist −93 m Extreme ultraviolet lithography →Market Growth Projection
- 14:3014:30, 21 July 2024 diff hist −147 Extreme ultraviolet lithography →History and Economic Impact
9 June 2024
- 05:5305:53, 9 June 2024 diff hist −35 Extreme ultraviolet lithography completed cleanup
- 05:5105:51, 9 June 2024 diff hist −26 Extreme ultraviolet lithography →EUV stochastic issues
- 05:4905:49, 9 June 2024 diff hist −1,265 Extreme ultraviolet lithography →EUV photoresist exposure: the role of electrons
- 05:4605:46, 9 June 2024 diff hist −109 Extreme ultraviolet lithography →EUV stochastic issues
- 05:4505:45, 9 June 2024 diff hist −113 Extreme ultraviolet lithography →EUV stochastic issues
- 05:4305:43, 9 June 2024 diff hist −210 Extreme ultraviolet lithography →Use with multiple-patterning
- 04:5504:55, 9 June 2024 diff hist −14,246 Extreme ultraviolet lithography cleanup started
17 April 2024
- 00:5200:52, 17 April 2024 diff hist −239 Multiple patterning →Multipatterning productivity improvements
22 March 2024
- 01:0801:08, 22 March 2024 diff hist 0 Extreme ultraviolet lithography →EUV-induced plasma
- 01:0701:07, 22 March 2024 diff hist +68 Extreme ultraviolet lithography →EUV-induced plasma
21 March 2024
- 14:5414:54, 21 March 2024 diff hist +175 m Extreme ultraviolet lithography →EUV-induced plasma: figure
- 14:4214:42, 21 March 2024 diff hist +355 Extreme ultraviolet lithography →EUV-induced plasma
- 14:3614:36, 21 March 2024 diff hist −530 m Extreme ultraviolet lithography →Impact of photoelectron and secondary electron travel on resolution: cleanup
18 March 2024
7 January 2024
- 04:4404:44, 7 January 2024 diff hist +726 Extreme ultraviolet lithography →EUV-induced Plasma
- 04:3604:36, 7 January 2024 diff hist +166 Extreme ultraviolet lithography EUV-induced plasma section
10 December 2023
- 08:5408:54, 10 December 2023 diff hist 0 Multiple patterning →Pitch splitting
- 08:5308:53, 10 December 2023 diff hist +145 Multiple patterning →Pitch splitting
- 08:4608:46, 10 December 2023 diff hist +425 Multiple patterning →Pitch splitting: stitching
30 September 2023
- 14:0314:03, 30 September 2023 diff hist +178 Multiple patterning →Industrial adoption
- 14:0014:00, 30 September 2023 diff hist −5 Multiple patterning →7nm and 5nm FinFETs
- 13:5913:59, 30 September 2023 diff hist +150 Multiple patterning →Industrial adoption: 3nm
- 13:5513:55, 30 September 2023 diff hist −376 Multiple patterning →Mixed patterning methods
- 13:5413:54, 30 September 2023 diff hist −664 Multiple patterning →Mixed patterning methods: Figure cleanup
17 August 2023
- 14:0714:07, 17 August 2023 diff hist −1 Extreme ultraviolet lithography →Effect of underlying layers
- 14:0214:02, 17 August 2023 diff hist 0 m Extreme ultraviolet lithography →Secondary electron blur vs. dose
- 14:0214:02, 17 August 2023 diff hist 0 m Extreme ultraviolet lithography →Secondary electron blur vs. dose
- 14:0114:01, 17 August 2023 diff hist +1 m Extreme ultraviolet lithography →Effect of underlying layers: picture location
- 14:0014:00, 17 August 2023 diff hist +504 Extreme ultraviolet lithography →EUV photoresist exposure: the role of electrons
24 June 2023
7 May 2023
- 15:3215:32, 7 May 2023 diff hist −4 Extreme ultraviolet lithography →EUV stochastic issues
- 15:3115:31, 7 May 2023 diff hist +114 Extreme ultraviolet lithography →EUV stochastic issues
18 April 2023
- 04:2004:20, 18 April 2023 diff hist 0 m Extreme ultraviolet lithography →Single-patterning extension: anamorphic high-NA Tag: Manual revert
- 04:1804:18, 18 April 2023 diff hist 0 m Extreme ultraviolet lithography →Single-patterning extension: anamorphic high-NA Tag: Reverted
- 03:5603:56, 18 April 2023 diff hist +321 Extreme ultraviolet lithography →Single-patterning extension: anamorphic high-NA
10 April 2023
- 01:2401:24, 10 April 2023 diff hist +173 Multiple patterning →Different parts of layout requiring different illuminations
9 April 2023
- 21:3821:38, 9 April 2023 diff hist +217 Multiple patterning →Different parts of layout requiring different illuminations
29 March 2023
16 February 2023
- 16:1916:19, 16 February 2023 diff hist +38 Extreme ultraviolet lithography →Reduction of pupil fill
- 10:2710:27, 16 February 2023 diff hist +12 Extreme ultraviolet lithography →Reduction of pupil fill
- 06:5106:51, 16 February 2023 diff hist +6 m Extreme ultraviolet lithography →Reduction of pupil fill
- 06:2206:22, 16 February 2023 diff hist +75 Extreme ultraviolet lithography →Reduction of pupil fill
- 06:2106:21, 16 February 2023 diff hist +64 Extreme ultraviolet lithography →Reduction of pupil fill
- 05:4205:42, 16 February 2023 diff hist +17 Extreme ultraviolet lithography →Reduction of pupil fill
- 05:4105:41, 16 February 2023 diff hist +72 Extreme ultraviolet lithography →Reduction of pupil fill