File:Locos (microtechnology) process.svg
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![File:Locos (microtechnology) process.svg](http://upload.wikimedia.org/wikipedia/commons/thumb/8/8b/Locos_%28microtechnology%29_process.svg/385px-Locos_%28microtechnology%29_process.svg.png)
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Date/Time | Thumbnail | Dimensions | User | Comment | |
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current | 19:02, 14 December 2009 | ![]() | 512 × 796 (27 KB) | Cepheiden | some fixes |
16:53, 19 January 2008 | ![]() | 625 × 1,000 (56 KB) | Twisp | {{Information |Description= {{en|The image illustrates the LOCOS technology used in microfabrication mostly to create isolating structures. I. Preparation of silicon substrate II. CVD deposition of SiO2, pad/buffer oxide III. CVD deposition of Si3N4, ni |
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