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English: Comparison of high-k dielectric structure with conventional silicon dioxide gate dielectric. Schematic is my graphical representation of an idea in the presentation by G. E. Moore, Intel Inc. [1]
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Author w:User:Anoopm
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Date/TimeThumbnailDimensionsUserComment
current16:37, 5 January 2006Thumbnail for version as of 16:37, 5 January 2006401 × 235 (9 KB)AnoopmComparison of high-k dielectric structure with conventional silicon dioxide gate dielectric.
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